论文专著:
已在国内外主要刊物上发表了90余篇论文,著有30万字专著《CMOS集成电路原理、制造及应用》一本。
出版专著:
1. 《CMOS集成电路原理制造及应用》,刘忠立,电子工业出版社,1990年。
2. 《研究生专业参考教程第一卷》,本书共六章,刘忠立著第六章:“微电子学中的半导体器件”,1995年,中科院半导体所内部发行。
3. 《电子器件抗辐射加固技术》,本书共九章,刘忠立著第七章:“CMOS/SOS 及 CMOS/SOI 集成电路的辐射效应及加固技术”,装备部出版, 2001年。
4. 《特高频射频识别技术及应用》,李全圣,刘忠立,吴里江,国防工业出版社,2001年。
出版译著:
1. 《半导体辐射探测器》,刘忠立译,国防工业出版社, 2004年。
2. 《先进半导体材料及器件的辐射效应》,刘忠立译,国防工业出版社, 2008年。
发表论文:
1. 刘忠立,论N沟道增强型MOS晶体管,半导体通讯,1973,No.3, pp1-7.
2. 刘忠立,用于钝化钠离子的掺HCL氧化方法,全国半导体表面钝化会议,1975,pp126-130.
3. 刘忠立,P沟Si栅N沟Al栅CMOS手表电路,半导体通讯,1976, No.3, pp1-10.
4. 刘忠立,一种简易的监控Si-SiO2界面质量的水银探针,物理学报,1977, Vol.26, No.3, pp281-284.
5. 刘忠立,用于MOS器件阈值电压设计的诺摸图,无线电技术,1977, pp44-45.
6. Liu Zhongli, et al, CMOS Devices Buried Silicon Nitride Formed by Nitrogen Implantation, Proceeding of 12th ESSDERC, Sept.1982, pp172.
7. G.Zimmer, Liu Zhongli, et al, Buried Silicon-Nitride Layers Formed by Nitrogen-Ion Implantation and High-Temperature Annealing, Ion Implantation Equipment and Technology (H.Ryssel and H.Glawishs), 1983, pp426-432.
8. Zimmer G, Neubert E, Zetzmann, W, Liu, Z, CMOS-DEVICES ISOLATED BY ION-IMPLANTED BURIED SILICON NITRIDE, Technical Digest - International Electron Devices Meeting, 1982, pp 789-790.
9. G.Zimmer, Liu Zhongli, et al, CMOS Technologie auf Vergrabennen Ziliziumnitrid, MTG-Fachtagung Grossintegration, 1982, pp130-133.
10. 刘忠立等,离子注入氮化硅隔离的CMOS器件,半导体学报,1983, Vol.4,No.6,pp601-605.
11. 刘忠立,N阱全离子注入硅栅CMOS工艺中短和窄沟MOS晶体管的某些实验特性,第三届全国半导体集成电路和硅材料学术会议论文集,1983, pp282-283.
12. Liu Zhongli, et al, High Performance Radiation Tolerant CMOS/SOS ICs, Institute of Semiconductors, Academy Sinica,Research Progress Report, 1985-1986, Vol.5, pp38-40.
13. 刘忠立等, SOS/CMOS集成电路的研制及其在存储电路中的应用展望,第五届信息存储技术学会论文集, 1986.
14. 刘忠立等,加固至抗γ总剂量达107 Rad(Si)的SOS/CMOS ICs,抗核加固,1987, Vol.4, No.1.
15. 刘忠立等,高水平抗辐射SOS/CMOS集成电路,第五届全国半导体集成电路和硅材料学术会议论文集,pp139-141.
16. 刘忠立等,CMOS/SOS集成电路输入保护电路设计,“抗核辐射电子学会论文集”,1987.
17. Liu Zhongli, et al, An Excellent High Voltage NMOS/SOS Driver, the Proceeding of the Second International Conference on Solid-State and Integrated Circuit Technology, Oct. 1989, pp 449-451.
18. 刘忠立等,一种优良的NMOS/SOS驱动器,第六届全国半导体集成电路和硅材料学术会议论文集,1989, pp216-217.
19. 刘忠立等,用于通信卫星上的CMOS/SOS集成电路, 抗核加固,1990, No.3.
20. 刘荣寰,刘忠立等,加固的CMOS/SOS集成电路抗γ瞬态辐射的最新结果,抗核加固,1990, No.3.
21. 刘忠立等,多晶硅掺杂方式对MOS电容器电离辐射特性的影响,抗核加固技术研究,1992年部分成果集,国防预研抗辐射加固项目办公室编,1992, pp 130-132.
22. 和致经,刘忠立等,SOS 结构条形栅MOS管岛边效应的加固技术,第五届全国抗辐射电子学学术会议,1993,pp 72-75.
23. 刘忠立,MOS电容器中电离辐射产生的界面态同SiO2内被陷阱俘获的空穴电荷之间的关系, 第五届全国抗辐射电子学学术会议,1993, pp69-71.
24. 刘忠立,军用CMOS/ SOS的可靠性及发展动态,军用电子元器件可靠性论文选,国防科工委军用电子元器件可靠性专业组编,1994, pp32-36.
25. Zhongli Liu, et al, Improvement of CMOS/SOS Devices Characteristics by a Modified Solid Phase Epitaxy, Proceedings of the 5th International Conference on Solid-State and Integrated Circuit Technology , 1998, pp191-194.
26. Jiping Nie, Zhongli Liu, et al, JFET/SOS Devices: Processing and Gamma Radiation Effects, Proceedings of the 5th International Conference on Solid-State and Integrated Circuit Technology, 1998, pp67-70.
27. Wenyu Gao, Zhongli Liu, et al, Dependence of Ultra Thing Gate Oxide Reliability on Surface Clealing Approach, the Proceedings of the 5th International Conference on Solid-State and Integrated Circuit Technology,1998, pp291-294.
28. 高文钰,刘忠立等,硅表面清洗对热氧化13nm SiO2可靠性的影响,半导体学报,1999, Vol.20, No.5, pp383-388.
29. 聂纪平,刘忠立等,辐射加固的JFET/SOS:工艺及γ辐射效应,半导体学报,1999, Vol.20, No.8, pp676-681.
30. 刘忠立等,利用改进的固相外延技术改善CMOS/SOS器件的特性,半导体学报,1999, Vol.20, No.5, pp433-437.
31. 高文钰,刘忠立等,硅表面清洗对7nm热 SiO2栅介质可靠性的影响,半导体学报,1999, Vol.20, No.10, pp930-935.
32. 魏红振,余金中,刘忠立,王启明,硅基光波导及光波导开关的研究进展,半导体光电,1999, Vol.20, pp369-376.
33. 高文钰,刘忠立等,硼扩散引起的SiO2栅介质的性能退化,电子学报,1999, Vol.27, No.8, pp144.
34. 魏红振,余金中,张小峰,刘忠立等,SOI光波导分束器,第四届SOI技术研讨会论文集,2000, pp147-149.
35. 刘新宇,刘忠立,吴德馨等,0.8-1.2µm SOI/ CMOS 工艺研究,第四届SOI技术研讨会论文集,2000, pp78-82.
36. 刘新宇,刘忠立,吴德馨等,一种40nm的SOI 64k CMOS SRAM研究, 第四届SOI技术研讨会论文集,2000, pp34-38.
37. 王延峰,刘忠立等,闪烁存储器分类及其应用,集成电路设计,2000, No.2.
38. 刘忠立, 信息领域中的主要新型元器件(上),电子产品世界,2000, N o.4,pp52-53.
39. 刘忠立,信息领域中的主要新型元器件(下),电子产品世界,2000,No.5,pp73-74.
40. Wang Qiyuan, Nie Jiping, Liu Zhongli, Growth of Thin Silicon on Sapphire (SOS) Film Materials and Device Applications, Chinese Journal of Semiconductors, 2000, Vol.21, No.6, pp521-528.
41. Wei H.Z.,YJ.Z.,Liu Z.L.,Wang Q.M.,Fang C.S.,1x4 MMI Splitter Based on Rib SOI Waveguide, ChineseJournal of Lasers B(English Edition), Vol.9,No.6,December,pp525-530.
42. Wei H.Z.,YJ.Z.,Liu Z.L.,Zhang C.H.,SOI Based 3db MMI Splitter, Chinese Journal of Semiconductors, 2000, Vol.21,No.11,November,pp1111-1115.
43. Hongzhen Wei, Jinzhong Yu, Zhongli Liu, et al, Fabrication of 2x2 Tapered Multimode Interference Coupler, Electronics Letters, 2000, Vol.36, No.19 , pp1618-161.
44. Wei Hongzhen, Liu Zhongli, et.al, Integrated Multimode Interference Couplers in Silicon-on Insulator, In Optical,Interconnects for Telecommunication and Data communications, Proceedings of SPIE, 2000, pp124-127.
45. 王姝睿,, 刘忠立, SiC器件工艺的发展状况,微电子学,2000, Vol. 30, No. 6, pp422-425.
46. 王延峰,刘忠立, 离子注入氮化薄栅SiO2的特性,半导体学报,2001, Vol.22, No.7, pp881-884.
47. 刘忠立, 薄SiO2 MOS电容电离辐射陷阱电荷研究,半导体学报,2001, Vol.22, No.7, pp904-907.
48. 王姝睿,刘忠立, 6H-SiC高反压台面pn结二极管,半导体学报,2001, Vol.22, No.4, pp507-510.
49. 王姝睿, 刘忠立等, 6H-SiC高压肖特基势垒二极管,半导体学报,2001, Vol.22, No.8, pp1052-1056.
50. Liu zhongli et al, Ti Schottky Barrier Diodes on n-type 6H-SiC, the Proceedings of the 6th International Conference on Solid-State and Integrated circuit Technology, 2001, pp1183-1186.
51. Hongzhen Wei, Jinzhong Yu, Zhongli Liu, Fabrication of 4x4 tapered multimode interference coupler, IEEE Photon.Technol.Lett.,2001, Vol.13, No.5, pp466-468.
52. H. Wei, J. Yu Yu, Z. Liu, et al, Signal bandwidth of general NxN Multimode Interference couplers, J.of Light wave Technol., 2001, Vol.13, No.5, pp466-468.
53. Wei Hongzhen, Yu Jinzhong , Liu Zhongli, et al, 2x2 Multimode Interference Coupler with large tolerance, Chinese.Phys.Lett., 2001, Vol.18, No.2, pp245-247.
54. Wei, H. Z., Yu J. Z., Zhang X.F.,Liu Z.L., Wang Q.M.,Modeling of Multimode Interference Mach-ZehnderInterferometerOpticalSwitches,ActaOpticSinica,2001,Vol.21,No.3,March,pp367-370.
55. Wei Hongzhen, Yu Jinzhong , Liu Zhongli, et al, 1x4 MMI Splitter Based on Rib SOI Waveguide, J.of Chinese Lasers, 2000, B9, No.6, pp523-530.
56. 刘忠立, 超大规模集成电路中的离子注入技术, 第十一届全国电子束﹑离子束﹑光子束学术年会论文集,2001, pp 148.
57. 魏红振,余金中,刘忠立,王启明,硅基光波导及光开关研究进展,半导体光电,Vol.22, No.1 , 2001,pp7-11.
58. 王姝睿,刘忠立等, N型6H-SiC MOS 电容的电学特性,半导体学报, Vol.22, No.6, 2001,pp755-759.
59. 刘忠立,用真空紫外光(VUV)研究Si- SiO2结构的电离辐射效应,第七届全国抗辐射电子学与电磁脉冲学术年会论文集,2001,pp195-197.
60. 刘忠立,于芳,和致经等,加固的2000门阵CMOS/SOS集成电路的辐射试验结果,第七届全国抗辐射电子学与电磁脉冲学术年会论文集,2001,pp20-26.
61. 刘忠立,于芳,和致经等,具有优良辐射加固特性的CMOS/SOS 54HCS电路,第七届全国抗辐射电子学与电磁脉冲学术年会论文集,2001,pp27-32.
62. Wei H.Z, Yu J.Z, Zhang X.F, Liu Z.L, et al, Simple method for estimating minimum bend radii of SOI single mode curved rib waveguides, JOURNAL OF INFRARED AND MILLIMETER WAVES, 2001, Vol 20, No. 5, pp 398-400.
63. Wei H.Z, Yu J.Z, Zhang X.F, Liu Z.L, Compact 3-dB tapered multimode interference coupler in silicon-on-insulator, OPTICS LETTERS, 2001, Vol 26, No. 12, pp 878-880.
64. Wang Shurri , Liu Zhongli,Li Guohua ,Yu Fang,and Liu Huanzhang,High-Voltage Ti/6HSiC Schottky Barrier Diodes,Chinese Journal of Semiconductors, 2001, Vol 22,No.8,pp962-966
65. Yan Qingfen,Yu Jingzhong and Liu Zhongli, Design of 4x4 Area Modulation Silicon-on-Insulator Multimode Interference Coupler Optical Switch, Semiconductor Optoelectronics, 2002, 23(3), pp174-177(in Chinese).
66. Yan Qingfen,Yu Jingzhong and Liu Zhongli, Silicon: the Promising Material for Photonic Integraed Circuits Platform, the 6th Multi-Conference on System, Cybernetics and Informatics, Orlando, July, Florida, USA,2002.
67. Shurui Wang, Zhongli Liu, Studies of 6H-SiC Devices, Current Applied Physics, 2(2002), pp393-399.
68. 刘忠立等,氮氧注入SOI结构的抗总剂量电离辐射特性,第五届全国SOI技术会议,2002, pp 6-11.
69. 刘忠立等,低剂量注入“4”SOI圆片PMOSFET的辐射加固特性,第五届全国SOI技术会议,2002, pp 120-123.
70. 刘忠立等, 国产“6”低剂量注入SIMOX圆片NMOSFET辐射加固特性,第五届全国SOI技术会议,2002, pp 124-127.
71. 宁瑾,赵慧,刘忠立,电容式微传声器研制新进展,电子器件,2002, Vol.25, No.1, pp 9-13.
72. Liwen Tan, Yude Zan, Jun Wang, Qiyuan Wang, Yuanhuan Yu,Shurui Wang, Langying Lin .Very Low-Pressure VLP-VCD Growth of High Quality γ-Al2O3 Film on Silicon by Multi-Step Process, Journal of Crystal ,Growth,236(2002), pp 262-266
73. 尚也淳,刘忠立,王姝睿,SiC Schottky结反向特性的研究, 物理学报,2003,Vol.52, No.1, pp210-215.
74. 尚也淳,刘忠立,王姝睿,6HSiC Schottky 二极管的正向特性,半导体学报, 2003,Vol.24, No.5, p p504-509.
75. NIng Jin, Liu Zhongli, Liu Huanzhang,Ge Yongcai,”Fabrication of Silicon Condenser Microphong Using Oxdised Silicon as Sacrificial Layer”,Journal of Semicondors, Vol. No.5, 2003, pp,449-453.
76. Yan Qing-feng, Yu Jin-zhong, Xia Jin-song and Liu Zhong-li, High-Speed Electrooptic VOA Integrated in SOI Waveguide, Chinese Optics Letters,2003,1(4), pp217-219.
77. 严清峰,余金中,刘忠立,4x4区域调制多模干涉耦合器SOI 光波导开关的设计,光子学报,2002,23(3),pp174-177.
78. 王建林,刘忠立, RTD高频等效电路的研究及应用现状, 电子器件, 2003, Vol.26, No1. pp 29-33.
79. 宁瑾,刘忠立,刘焕章,葛永才,多孔硅在电容式微传声器制备的应用研究,微细加工技术,2003, No1, pp76-8,.
80. 宁瑾,刘焕章,葛永才,刘忠立,用作牺牲层制备硅基电容式微传声器,半导体学报,2003, Vol.24,Supplement, pp187-191.
81. 宁瑾,刘忠立,用氧化多孔硅作牺牲层制备悬空微结构,功能材料与器件学报,2003,Vol.9, No.3, pp 319-322.
82. 宁瑾,刘忠立,电容式微传声器的性能模拟与优化设计,半导体学报,2003,Vol.24, No8, pp877-881.
83. 杨笛,余金中,刘忠立,光纤与波导的联接技术,激光与红外,2003, Vol.33, No4, pp306-310.
84. Liwen Tan,Qiyuan Wang,Jun Wang, Yuanhuan Yu, Zhongli Liu,Langying Lin,Fabrication of Novel Double-Hetero0Epitaxial SOI Structure Si/γ-Al2O3/Si,Journal of Crystal Growth ,247(2003), pp 255-260.
85. Zhang Enxia,Yi wanbin,Liu Xianghua,ChanMeng,liuZhongli,WangXi,Silicon-on-Insulating Multi-Layers for Tolal-Dos Irradiation Hardness, CHIN .PHYS.LETT, 2004 ,Vol.21.No.8, pp1600-1603.
86. 刘忠立,SOI CMOS模拟集成电路发展概述,微电子学,2004, Vol.34, , No4, pp384-389.
87. 姜凡,刘忠立,SOI集成电路的ESD保护技术研究进展,2004,Vol.34, No5, pp497-500.
88. Zhongli Liu,The Status,Limits and Countermeasures in the Development of the Silicon Microelectronics Industry,7th International Conference on Solid-State and Integrated Circuits Technology Proceedings,October ,2005,18-21,pp255-257.
89. Zhong-Shan Zhong, Zhongli Liu, Guo-Qiang Zhang, Ning Li, Kai Fan, Effect of Implantation on the Mobility of Channel Electron for Partially Depleted SOI nMOSFET, 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings,October ,2005,18-21,pp277-257.
90. Wang Jianlin, Liu Zhongli, Wang Liangchen, Zeng Yiping, Yang Fuhua, Bai Yunxia, High Performsnce Tunneling Diode on a New Material Structure, 7th October ,2005,18-21,pp648-650.
91. Guuo-Qiang Zhang, Zhongli Liu, Ning Li, Zhong-Sha Zhong, Guohua Li, Qing Ling, Zhengxuan Zhang,Chenglu Lin, Influence of Fluorine on Radiation-Induced Charge Trapping in the SIMOX Buried Oxides, 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings,October,2005, 18-21,pp847-850 .
92. Ning Li, Guuo-Qiang Zhang, Zhongli Liu, Kai Fan, Zhong-Shan Zhong, Radiation Response of Partially-Depleted MOS Transistors Fabricated in the Fluofinated SIMOX Wafers, 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings,October,2005, 18-21,pp851-855.
93. Jiang Fan, Liu Zhongli, A Simulation of Body Contact Structure in PD SOI Analogue Circuit, 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings,October,2005, 18-21,pp1019-1020.
94. Jin Ning, Zhongli Liu, Huanzhang Liu, Yongcai Ge, A Silicon Capacitive Microphone Based on Oxidized Porous Silicon Sacrificial Technology, 7th International Conference on Solid-State and Integrated Circuits Technology Proceedings,October,2005,18-21,pp1872-1875.
95. W B Yi, E X Zhang, M Chen, N Li, G Q Zhang, Z L Liu and X Wang, Formation of total-dose-radiation harden materials by sequential oxygen and nitrogen implantation and multi-step annealing,Semicond,Sci.Technol. 19(2004),pp1-3
96. 郑中山,刘忠立,张国强,李宁,范揩,张恩霞,易万兵,陈猛,王曦,埋氧层注氮工艺对部分耗尽SOI nMOSFET特性的影响,物理学报,2005, Vol.54, No.1, pp 348-353.
97. Zheng Zhong-shan, Liu Zhong-li, Zhang Guo-qiang, Li Ning, Fan Kai, Zhang En-Xia, Yi Wan-bing, Chen Meng, Wang Xi,Effects of Techniques of Implanting Nitrogen into Buried Oxide on the Characteristics of Partially Depleted SOI PMOSFET,Chinese Physics Letters,2005,Vol.22,No.3,PP 654-656.
98. Zheng Zhong-shan, Liu Zhong-li, Zhang Guo-qiang, Li Ning, Fan Kai, Zhang En-Xia, Yi Wan-bing, Chen Meng, Wang Xi,Effect of the techology of implanting nitrogen into buried oxide on the radiation hardness of the top gate oxide for partially depleted SOI PMOSFET,Chinese Physics, 2005,Vol.14,No.3, PP 565-570.
99. Zhong-shan Zheng, Zhong-li Liu,Guo-qiang Zhang,Ning Li,Guo-hua Li,Hong-zhi Ma,En-Xia Zhang,Zheng-xuan, Zhang and Xi Wang ,Improvement of the radiation hardness of SIMOX buried layers using nitrogen implanting,Semiconductor Science and Technology,2005,Vol.20,PP 481-484.
100. Zheng Zhong-shan, Liu Zhong-li, Li Ning, Li Guo-hua,Ma Hong-zhi,Zhang En-Xia,Zhang Zheng-xuan,and Wang Xi,Sensitivity of Total-Dose Radiation Hardness of SIMOX Buried Oxides to Doses of Nitrogen Implantation into Buried Oxides,Chinese Journal of Semiconductors,2005,Vol.26,No 5,PP 862-866.
101. 张国强,刘忠立,李宁,范楷,郑中山,张恩霞,易方兵,陈猛,王曦,注氮工艺对SIMOX器件电特性的影响,半导体学报,2005,Vol.26,No. 4,PP 835-839.
102. 李宁,张国强,刘忠立,范楷,郑中山,林青,张正选,林成鲁,部分耗尽型注氮SIMOX器件的电离辐射效应,半导体学报,2005,Vol.26,No 2,PP 349-353.
103. 王建林,刘忠立,王良臣,曾一平,杨富华,白云霞,RTD与PHEMT集成的记几个关键工艺,半导体学报,2005,Vol 26,No 2,PP 349-353.
104. Wang Jianlin,Wang liangchen,Zeng Yiping,Liu Zhongl,Yang Fuhua,and Bai Yunxia,Design and Realization of Resonant Tunneling Diodes with New Material Structure,Semiconductor Science and Technology,2005,Vol.26,No.1,1-5.
105. 宁瑾,刘忠立,高见头,n型4H-SiC MOS 电容特性,半导体学报,2005,Vol.26 ,6(增刊),PP 140-143.
106. 刘忠立,李宁,高见头,于芳,改性的薄SOS膜CMOS器件辐射加固特性半导体学报,2005,Vol.26,No.7,PP 1406-1411.
107. 尹雪松,姜凡,刘忠立,部分耗尽型SOI号CMOS 模拟电路设计研究,半导体技术,2005,Vol.30,No.4,PP 54-57.
108. 刘忠立,SOI寄生结构引起的辐射效应及加固措施,第八届全国抗辐射电子学与 电磁脉冲学术年会论文集,2005,pp25-31.
109. 郑中山,刘忠立,张嗯霞等,应用埋氧注氮对SIMOX材料辐射加固的研究,第八届全国抗辐射电子学与电磁脉冲学术年会论文集,2005,pp32-35.
110. 宁瑾,刘忠立,孙国胜等,4H-SiC肖特基二级管抗辐射特性的研究,第八届全国抗辐射电子学与电磁脉冲学术年会论文集,2005,pp41-45.
111. 郑中山,刘忠立,埋氧注层注氟对部分耗尽SOIMOSFET 阈值电压的影响,第六届全国SOI技术研讨会论文集,2005,pp104-107.
112. 赵凯,姜凡,刘忠立,0.8μm PD SOICMOS128KSRAM的设计及仿真,第六届全国SOI技术研讨会论文集,2005,pp120-125.
113. Zhao Kai,Liu Zhongli, Xiao Zhiqiang,and Hong Genshen, Radiation Hardened 128K PDSOI CMOS RAM,8thStatic International Conference on Solid- State and Integrated Circuits Technology Proceedings,IEEE Press,2006,Oct. 23-36,PP1922-1924.
114. Ning Jing,Sun Guosheng,Gong Quancheng,Liu Zhongli,Fabrication of Poly Crystalline 3C-SiC Resonator, 8thStatic International Conference on Solid- State and Integrated Circuits Technology Proceedings,IEEE Press,2006,Oct. 23-36, PP572-574.
115. Liu Zhongli,Li Ning,Gao Jiantou,Yu Fang,Radiation Hardened Performance of CMOS Devices Fabricated by Using Modified Thin SOS Film, 8thStatic International Conference on Solid- State and Integrated Circuits Technology Proceedings,EEE Press,2006 ,Oct. 23-36, PP1132-1134.
116. 刘忠立,辐射加固SOICMOS技术的发展状态及展望,第七届全国SOI技术研讨会论文集,PP14-18.
117. Ning,Li,Ni ng-Juan Wang,Zhong-li Liu,Guo-Qiang Zhang,Zhong-Shang Zheng,Ionizing Irradiation Effect of Fluorine Implanted Metal-BOX-Silicon Structure Based on SOI,The 9th International Conference on Solid-State and Integrated Circuits Technology ,ICSICT ,2008.
118. Kun Zhang,Hongmin Yu,Stanley L.Chen,and Zhongli Liu,A Synthesis Tool for Tile-Based Heterogeneous FPGA,Proceedings of IEEE ,The 9th International Conference on Solid-State and Integrated Circuits Technology ,ICSICT ,2008.
119. Yu Honghin,Chen Stanley L,and Liu Zhongli,Desigh of Dedicated Reconfigurable Multiplier in a FPGA, 半导体学报,2008,Vol.29.
120. Honghin Yu, Gaoshan Li,Zhongli Liu,A VSLMS Style Tap-lengh Learning Algorithm for Stucture Adaptation, 11th IEEE International Conference on Communication Systems 2008 (ICCS 2008), Nov. 19-21, 2008, Guangzhou, China.
121. Huabing Zhou, Minghao Ni, Stanley Chen, Zhongli Liu, Packing LUT Clusters with Network Programming, IEEE Internationa Symposium on Intrgrated Circuits,ISIC ,2007.
122. Zhongli Liu, Ru Huang, Jiantou Gao, Shoubin Xue, and Fang Yu, Single Event Effects Resulted by parasitic Structures of MOS Transistors in SOI CMOS ICs and Their Hardness, Proceedings of IEEE The 10th International Conference on Solid-State and Integrated Circuits Technology ,ICSICT ,2010,pp2074-207.
123. Zhao Kai, Gao Jiantou1, Liu Zhongli,Yu Fang1, Li Ning1,Yang Bo1, Wang Ningjuan1,XiaoZhiqiang and Hong Genshen,Radiation Hardened 256K CMOS SOI SRAM, Proceedings of IEEE The 11th International Conference on Solid-State and Integrated Circuits Technology ,ICSICT ,2010,pp208-210.
124.刘忠立,硅微电子工业的发展状态、限制、对策及辐射加固的考虑,第十届全国抗辐射电子学与电磁脉冲学术年会论文集,2009,pp1-4.
125.刘忠立,SiC 功率半导体器件的优势及发展前景,电力电子,2009年第6期,pp11-13.